Microfabrication of ultra-thick SU-8 photoresist for microengines

نویسندگان

  • Peng Jin
  • Kyle Jiang
  • Nianjun Sun
چکیده

A high quality UV-lithographic process for making high aspect ratio micro reciprocating engine parts on ultra-thick SU8 photoresist CO2 is described. The research work is part of an on-going microengine research project at the University of Birmingham. The project aims to develop a compact power plant for driving MEMS devices and replacing batteries. The novelty of engine design is that the engine is constructed in two layers only, and all parts are designed to suit the 2D microfabrication feature. Due to the strict requirements on the perpendicular geometry of the engine parts, the microfabrication research work has been concentrated in conducting a high quality UV-lithographic process on ultrathick SU-8 for producing microengine parts. Based on the study of the optical property of ultra-thick SU-8 layer, optimized prebake time has been selected to obtain the minimum UV absorption by SU-8. The optimization principle has proved effective by a series of experiments of UV-lithography on different prebake times, and high aspect ratio structure (about 10) engine parts have been produced in 1000 μm ultra-thick SU-8 layers using the standard UVlithography equipment. The sidewall angles are controlled between 85~90 degrees, which is a much better improvement than those reported so far.

برای دانلود رایگان متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Ultrathick SU-8 fabrication for microreciprocating engines

Nianjun Sun Beijing Aeronautical Manufacturing Technology Research Institute P.O. Box 863 Beijing 100024 China Abstract. We present a high-quality UV-lithography process for making high aspect ratio microstructures for microengines using an ultrathick SU-8 photoresist layer. The microreciprocating engine project, which is ongoing at the University of Birmingham, aims to develop a compact power ...

متن کامل

A self-assembled monolayer-assisted surface microfabrication and release technique

This paper describes a method of thin film and MEMS processing which uses self-assembled monolayers as ultra-thin organic surface coating to enable a simple removal of microfabricated devices off the surface without wet chemical etching. A 1.5-nm thick self-assembled monolayer of dodecyltrichlorosilane reduces the adhesion between the SiO substrate surface 2 and a 100-nm thick evaporated alumin...

متن کامل

Releasing high aspect ratio SU-8 microstructures using AZ photoresist as a sacrificial layer on metallized Si substrates

This paper presents a successful method for releasing high aspect ratio SU-8 micro-structures by the use of positive photoresist (AZ 4620) as sacrificial layer. The AZ 4620 photoresist sacrificial layer was dissolved by the SU-8 developer (propylene glycol monomethyl ether acetate). Thus, this process reduces the need for complex microfabrication steps and equipments which are otherwise require...

متن کامل

Study on the postbaking process and the effects on UV lithography of high aspect ratio SU-8 microstructures

John D. Williams Wanjun Wang Louisiana State University Department of Mechanical Engineering Baton Rouge, Louisiana 70803 E-mail: [email protected] Abstract. In recent years, a relatively new type of negative photoresist, EPON SU-8, has received a lot of attention in the MEMS field because of its excellent lithography properties. Significant research efforts have been made to study the lithographic ...

متن کامل

Multistep synthesis on SU-8: combining microfabrication and solid-phase chemistry on a single material.

SU-8 is an epoxy-novolac resin and a well-established negative photoresist for microfabrication and microengineering. The photopolymerized resist is an extremely highly crosslinked polymer showing outstanding chemical and physical robustness with residual surface epoxy groups amenable for chemical functionalization. In this paper we describe, for the first time, the preparation and surface modi...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2003